Optical, Optoelectronic, and Third-Order Nonlinear Photonics of Ultrathin Molybdenum Oxide Film Deposited by Atomic Layer Deposition

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dc.contributor.authorBasyooni, Mohamed A. A.
dc.contributor.authorGundogdu, Yasemin
dc.contributor.authorKilic, Hamdi Sukur
dc.contributor.authorEker, Yasin Ramazan
dc.date.accessioned2024-02-23T13:03:32Z
dc.date.available2024-02-23T13:03:32Z
dc.date.issued2023
dc.departmentNEÜen_US
dc.description.abstractThe atomic layer deposition (ALD) technique has attracted significant attention because it enables the control of film synthesis at the subnanometre scale. Herein, molybdenum oxide (MoO3) ultrathin films using the ALD system through Bis(t-butylimido)bis(dimethylamino)molybdenum (VI) as a molybdenum (Mo) source are prepared. To understand the effect of deposition temperature, thin films are prepared at three different temperatures 100, 150, and 250 degrees C. The morphological and elemental properties are assessed using a field emission scanning electron microscope, scanning transmission electron microscopy, and energy-dispersive X-ray spectroscopy techniques. It is observed that the film thicknesses increase with the increase in the deposition temperature. It is found that the film growth at 150 degrees C is the most potential one for UV optoelectronic applications with high stability even under low applied bias voltages. Moreover, these films show interesting nonlinear optical behaviors as investigated with the z-scan technique applying open and closed aperture methods. The calculated nonlinear optical parameters including nonlinear absorption coefficient (beta), nonlinear refractive index (n(2)), nonlinear refractive coefficient (gamma), and third-order nonlinear susceptibility (chi((3))) are 10(-11) m W-1, 10(-16) cm(2) W-1, 10(-11) cm(2) W-1, and 10(-11) esu, respectively.en_US
dc.description.sponsorshipSelcuk University-Scientific Research Projects Coordination (BAP) Unit [13301022, 20211006, 18401178]en_US
dc.description.sponsorshipThe authors would like to kindly thank Selcuk University-High Technology Research and Application Center, Selcuk University-Laser Induced Proton Therapy Application and Research Center for supplying with Infrastructure, Selcuk University-Scientific Research Projects Coordination (BAP) Unit for grants via projects with references of 13301022, 20211006, and 18401178, and finally Necmettin Erbakan University-Science and Technology Research and Application Center (BITAM) for the continuous support through the characterizations section.en_US
dc.identifier.doi10.1002/pssa.202200689
dc.identifier.issn1862-6300
dc.identifier.issn1862-6319
dc.identifier.issue6en_US
dc.identifier.scopus2-s2.0-85147946378en_US
dc.identifier.scopusqualityQ2en_US
dc.identifier.urihttps://doi.org/10.1002/pssa.202200689
dc.identifier.urihttps://hdl.handle.net/20.500.12452/10660
dc.identifier.volume220en_US
dc.identifier.wosWOS:000935499900001en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherWiley-V C H Verlag Gmbhen_US
dc.relation.ispartofPhysica Status Solidi A-Applications And Materials Scienceen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectAtomic Layer Depositionen_US
dc.subjectMoo3en_US
dc.subjectNonlinear Opticsen_US
dc.subjectUltrathin Metal Oxide Thin Filmsen_US
dc.subjectZ-Scanen_US
dc.titleOptical, Optoelectronic, and Third-Order Nonlinear Photonics of Ultrathin Molybdenum Oxide Film Deposited by Atomic Layer Depositionen_US
dc.typeArticleen_US

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