Efficient MoWO3/VO2/MoS2/Si UV Schottky photodetectors; MoS2 optimization and monoclinic VO2 surface modifications
dc.contributor.author | Basyooni, Mohamed A. | |
dc.contributor.author | Zaki, Shrouk E. | |
dc.contributor.author | Shaban, Mohamed | |
dc.contributor.author | Eker, Yasin Ramazan | |
dc.contributor.author | Yilmaz, Mucahit | |
dc.date.accessioned | 2024-02-23T14:16:44Z | |
dc.date.available | 2024-02-23T14:16:44Z | |
dc.date.issued | 2020 | |
dc.department | NEÜ | en_US |
dc.description.abstract | The distinctive properties of strongly correlated oxides provide a variety of possibilities for modulating the properties of 2D transition metal dichalcogenides semiconductors; which represent a new class of superior optical and optoelectronic interfacing semiconductors. We report a novel approach to scaling-up molybdenum disulfide (MoS2) by combining the techniques of chemical and physical vapor deposition (CVD and PVD) and interfacing with a thin layer of monoclinic VO2. MoWO3/VO2/MoS2 photodetectors were manufactured at different sputtering times by depositing molybdenum oxide layers using a PVD technique on p-type silicon substrates followed by a sulphurization process in the CVD chamber. The high quality and the excellent structural and absorption properties of MoWO3/VO2/MoS2/Si with MoS2 deposited for 60 s enables its use as an efficient UV photodetector. The electronically coupled monoclinic VO2 layer on MoS2/Si causes a redshift and intensive MoS2 Raman peaks. Interestingly, the incorporation of VO2 dramatically changes the ratio between A-exciton (ground state exciton) and trion photoluminescence intensities of VO2/(30 s)MoS2/Si from < 1 to > 1. By increasing the deposition time of MoS2 from 60 to 180 s, the relative intensity of the B-exciton/Aexciton increases, whereas the lowest ratio at deposition time of 60 s refers to the high quality and low defect densities of the VO2/(60 s)MoS2/Si structure. Both the VO2/(60 s)MoS2/Si trion and A-exciton peaks have higher intensities compared with (60 s) MoS2/Si structure. The MoWO3/VO2/(60 s) MoS2/Si photodetector displays the highest photocurrent gain of 1.6, 4.32 x 10(8) Jones detectivity, and similar to 1.0 x 10(10) quantum efficiency at 365 nm. Moreover, the surface roughness and grains mapping are studied and a low semiconducting-metallic phase transition is observed at similar to 40 degrees C. | en_US |
dc.description.sponsorship | Scientific Research Projects Coordination (BAP)-Konya Necmettin Erbakan University (NEU) [191319007] | en_US |
dc.description.sponsorship | The authors declare that they have received financial support from Scientific Research Projects Coordination (BAP)-Konya Necmettin Erbakan University (NEU), under Project Number: 191319007 that have appeared to influence the work reported in this paper. Moreover, the authors would like to thank the Science and Technology Research and Application Center (BITAM)-NEU for the continuous support through the characterizations section. | en_US |
dc.identifier.doi | 10.1038/s41598-020-72990-9 | |
dc.identifier.issn | 2045-2322 | |
dc.identifier.issue | 1 | en_US |
dc.identifier.pmid | 32985575 | en_US |
dc.identifier.scopus | 2-s2.0-85091623296 | en_US |
dc.identifier.scopusquality | Q1 | en_US |
dc.identifier.uri | https://doi.org/10.1038/s41598-020-72990-9 | |
dc.identifier.uri | https://hdl.handle.net/20.500.12452/12767 | |
dc.identifier.volume | 10 | en_US |
dc.identifier.wos | WOS:000577349200002 | en_US |
dc.identifier.wosquality | Q1 | en_US |
dc.indekslendigikaynak | Web of Science | en_US |
dc.indekslendigikaynak | Scopus | en_US |
dc.indekslendigikaynak | PubMed | en_US |
dc.language.iso | en | en_US |
dc.publisher | Nature Portfolio | en_US |
dc.relation.ispartof | Scientific Reports | en_US |
dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | en_US |
dc.rights | info:eu-repo/semantics/openAccess | en_US |
dc.subject | [Keyword Not Available] | en_US |
dc.title | Efficient MoWO3/VO2/MoS2/Si UV Schottky photodetectors; MoS2 optimization and monoclinic VO2 surface modifications | en_US |
dc.type | Article | en_US |