Evaluation of photolitographic properties of functional groups containing polystyrenes
Küçük Resim Yok
Tarih
2022
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Pamukkale Univ
Erişim Hakkı
info:eu-repo/semantics/openAccess
Özet
In this study, different molecular weighted PSs were chemically modified by two functional modifiers (maleic anhydride (MA) and acetic anhydride (AA)) under optimum reaction conditions with BF3O(C2H5)2 catalyst and the bonding of active functional groups (MAPS: -CO-CH=CH-COOH and AAPS:-CO-CH3) to the aromatic ring of the polymer was carried out. Depending on the structure of the carboxyl and acetyl groups attached to the aromatic ring, the photolithographic properties were examined by solubility and FT-IR analysis, also the effect of borneol, which is used as a sensitizer-activator, on photolithographic properties was investigated. As a result, the optimum reaction conditions was found to be as PS:modifier mole ratio 1:0.2; modifier:catalyst molar ratio 1:1 and it was determined that more functional groups were attached to the structure of lower molecular weighted PS. It was determined that modified PSs dissolved less in toluene than virgin PS (70.04% and 85.48% respectively). In dissolution tests performed after irradiation, the best value was obtained from MAPS (54.51%), while there was no significant change in the dissolution values of AAPS (83.46%). However the solubility value of MAPS decreased to 49.67% with the irradiation process performed after the addition of borneol substance but there was no significant change in the solubility values of AAPS (84.50%). In addition, it was observed that the dissolution values decreased depending on the irradiation time in MAPS, but it was not observed in AAPS. The decrease in dissolution of MAPS after UV irradiation has proven that MAPSs are light sensitive and they are negative photoresists that crosslinked by light effect. It was observed that the borneol also supports the photoresist feature. Although AAPS gives lower dissolution values than virgin PS but no significant change was observed in dissolution values after UV -irradiation and it was determined that AAPS did not present photoresist properties.
Açıklama
Anahtar Kelimeler
Photoresist, Polystyrene, Modification, Anhydrite
Kaynak
Pamukkale University Journal Of Engineering Sciences-Pamukkale Universitesi Muhendislik Bilimleri Dergisi
WoS Q Değeri
Scopus Q Değeri
Cilt
28
Sayı
7
