Molybdenum disulfide thin films fabrication from multi-phase molybdenum oxide using magnetron sputtering and CVD systems together

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dc.contributor.authorKaratas, Ayse
dc.contributor.authorYilmaz, Mucahit
dc.date.accessioned2024-02-23T14:16:19Z
dc.date.available2024-02-23T14:16:19Z
dc.date.issued2020
dc.departmentNEÜen_US
dc.description.abstractMolybdenum disulfide (MoS2) is a layered 2D semiconducting material with a tunable bandgap and a promising materials for next generation optoelectronics applications. In this study, the characterization of large-scale MoS2 films obtained by sulfurization of Mo-O films grown in different thicknesses with reactive magnetron sputtering method at 400 degrees C are reported. At a critical deposition temperature of 400 degrees C, different phases of Mo-O structure with high photoluminescent and bandgap were observed. Although there are no triangular domains, bandgaps and PL properties are close to few-layered MoS2. The enhanced PL intensities attributed to the increasing amount of MoO2 that may cause MoS2's folding and the large number of electrons from MoO2 in the MoO2-MoS2 hetero-structure. The UV-VIS spectroscopy analysis shows that two bandgaps are presented with a low and high values which may extend a wide absorption range. One of these bandgaps is compatible with few-layer MoS2s and the other increases by the thickness of the Mo-O film grown by magnetron sputtering. This explains the absorption at low wavelengths, but also shows that the MoO2 structure can be used to adjust the band gaps of MoSs. The combined growth technique of magnetron sputtering and CVD is provided a high quality and homogeneous MoS2 thin films for next-generation optoelectronics and nanoelectronic devices, as well as for other potential applications.en_US
dc.description.sponsorshipScientific Research Projects Coordination Unit at Necmettin Erbakan University [171351002]en_US
dc.description.sponsorshipThis work has been supported by the Scientific Research Projects Coordination Unit at Necmettin Erbakan University with Grant No: 171351002.en_US
dc.identifier.doi10.1016/j.spmi.2020.106555
dc.identifier.issn0749-6036
dc.identifier.issn1096-3677
dc.identifier.scopus2-s2.0-85084335387en_US
dc.identifier.scopusqualityQ2en_US
dc.identifier.urihttps://doi.org/10.1016/j.spmi.2020.106555
dc.identifier.urihttps://hdl.handle.net/20.500.12452/12620
dc.identifier.volume143en_US
dc.identifier.wosWOS:000547103300008en_US
dc.identifier.wosqualityQ3en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherAcademic Press Ltd- Elsevier Science Ltden_US
dc.relation.ispartofSuperlattices And Microstructuresen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectMolybdenum Disulfideen_US
dc.subjectThin Filmsen_US
dc.subjectTwo-Dimensional Materialsen_US
dc.subjectTransition-Metal Dichalcogenidesen_US
dc.titleMolybdenum disulfide thin films fabrication from multi-phase molybdenum oxide using magnetron sputtering and CVD systems togetheren_US
dc.typeArticleen_US

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